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F. Ścigalski, M.Toczek, M. Sierocka


Photosensitive negative lacquer on the basis of chloromethylated polystyrene


Polimery 1991, No 6, 257


DOI: dx.doi.org/10.14314/polimery.1991.257

Summary

The conditions of polystyrene chloromethylation and subsequent esterification of chloromethylated polystyrene with sodium salt of cinnamic acid have been selected. This product of esterification served for the preparation of a photosensitive negative lacquer with a good adhesion to various types of substrate, high sensitivity and resistance to etching agents used in the electrotechnical industry. By incorporating diethylaminocinnamic grouping into the product of esterification the spectral range of sensitivity of the photopolymeric emulsion is shifted to the visible range of spectrum.


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