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Z.K. Brzozowski, M. Pijewski



UV-resistant epoxy-chalcone resins


Polimery 1998, No 11-12, 720


DOI: dx.doi.org/10.14314/polimery.1998.720


Summary

4,4'-Dihydroxychalcone (chalcone A) or 3-ethoxy-4,4'-dihydroxychalcone (chalcone В - a new compound) were obtained and then reacted with bisphenol A and epichlorohydrin (eqns. 1 and 2 and Tables 3 and 4). The concentration of chalcone in the bisphenol mixture should range from 40 to 60 mol% to yield a resin with good properties. Photo-crosslinking was carried out with a UV lamp at 150 W. The structure of the resulting resins before and after crosslinking was examined by FT-IR, NMR and UV techniques. The breaking strength (Figs. 1 and 3) of the resins was studiem in relation to resin composition and irradiation time. The good solubility of the chalcone В-based resins and their nontoxicity makes the resin 16 (Table 4) to be the best choice for printed circuit applications (Fig. 8 ).


Keywords: epoxy-chalcone resins, UV resistance


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